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About Shibaura Mechatronics Investor Relations Products Social and Environmental
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About Shibaura MechatronicsInvestor RelationsProducts Social and Environmental
Activities About Shibaura Mechatronics Investor RelationsProducts Social and Environmental
Activities
About Shibaura MechatronicsInvestor Relations Products Social and Environmental
Activities
Home > Products > Semiconductor Manufacturing Equipment > Single
Wafer Photomask Wet Cleaning Equipment
Cleans photo masks using chemicals and pure water to remove dust and stains that attach to the glass from the photo mask in the pattern forming process.
- High performance
Highly efficient cleaning with hot chemicals
High purity cleaning with original "Chemical Megasonic”
Improved chemical resistance by metal free structure - Low COO
Reduced consumption of pure water and chemicals by single wafer spinning
Small footprint - Expandability
Integration of spin unit, photo cleaning unit and IPA vapor drying unit
Applicable to various communications systems
