SC Series/SC300i Single Wafer Wet Cleaning Equipment

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Cleans wafers using chemicals and pure water to remove dust and stains that cause defects in the semiconductor wafer manufacturing process.

High performance
High levels of cleanliness and high uniformity through single wafer cleaning
Free from cross contamination
Low COO
Reduction of chemical costs by utilizing functional water
Wet cleaning with small volume of chemicals
Small footprint
Environmentally friendly
RCA-free cleaning and low chemical consumption
Energy saving process using room temperature cleaning